Laboratory Plasma Machine

We introduce our self as designer, developer and manufacturer of equipment’s required for this filmtechnology as well as surface treatment by plasma assisted CVD process.Our equipment is equipped with double walled water cooled high vacuum chamber vacuum up to0.05mm of hg.1. The substrate is heated up to 2000ﹾC by our unique design of induction heating.2. IR type remote serving temperature sensor with PID controller controls the substratetemperature from 300degree - 2000ﹾC.3. The equipment’s have two / four mass flow controllers to fed two / four different gases forrequired process with precise control of gas feeding.4. Our gas mixing chamber have unique design to mix all gases in its set proportion before it entersto vacuum chamber.5. PLASMA PROCESS: Our dedicated designed plasma with either DC pulse plasma or microwaveplasma for plasma enhanced CVD process or plasma surface treatment process.6. PLC : dedicated programmed PLC with Touch screen HMI to set process of vacuum temperaturegas flow, plasma power. The real time clock with logs the data of various parameter in real timesetting. This data can be stored as recipe of the process and it respects when selected again.7. PLC can be interface with lap top or computer and can remote control or seen.